NB Technologies and  Marabu GmbH & Co. KG  have developed a screen printing resist that is resistant against hydroflouric acid: Maramask PV-HF

Maramask PV-HF is a cost-effective solution for etching or electroplating in the field of solar cell manufacture. Maramask is resistant to hydrofluoric acid, and even after long exposure at high concentration it shows neither embrittling, nor a bleeding effect.

Maramask PV-HF applications
Maramask is the perfect mask for
- etching processes like e.g. the manufacturing of selective emitters by
   selective removal of highly doped layers
- etching as part of manufacturing of selective backside contacts
- the metallisation and electroplating of backside cells
- the formation of porous silicon (direct plating metallisation concepts)
- resist patterns in metallisation concepts involving electroplating

Maramask PV-HF main benefits
- very high resistance against hydrofluoric acid
- fine-line capability
- no bleeding out into process media
- good screen opening
- high temperature stability up to 90°C/194°F
- no UV exposure necessary for resist patterns

Further information
Product Info Maramask PV-HF
Technical Data Sheet Maramask PV-HF

Screen printing of resist compatible with hydrofluoric acid
Direct metallisation on silicon